Document Type
Conference Paper
Rights
Available under a Creative Commons Attribution Non-Commercial Share Alike 4.0 International Licence
Abstract
This paper outlines some aspects of process control in semiconductor manufacturing. Starting with an outline of the semiconductor manufacturing process, the contribution will discuss temperature control of the chemical vapour deposition stage and the control of the wafer etching process, based on the industrial experience of the first two authors. Subsequently, the authors draw the attention of the semiconductor manufacturing community to the potential of properly tuned PID controllers for the achievement of simple and high performance control solutions.
DOI
https://doi.org/10.21427/yy0q-6189
Recommended Citation
Relihan, Keelin and Geraghty, Shane and O'Dwyer, Aidan : Some aspects of process control in semiconductor manufacturing. Proceedings of IMC-24; the 24th International Manufacturing Conference, pp. 1097-1104, Waterford Institute of Technology, August, 2007. doi:10.21427/yy0q-6189
Included in
Controls and Control Theory Commons, Electronic Devices and Semiconductor Manufacturing Commons
Publication Details
Proceedings of IMC-24; the 24th International Manufacturing Conference, pp. 1097-1104, Waterford Institute of Technology, August, 2007.