Surface Relief Profile of Photopolymerisable Systems in a Single Illuminated Spot

Tsvetanka Babeva, Bulgarian Academy of Sciences
Dana Mackey, Dublin Institute of Technology
Izabela Naydenova, Dublin Institute of Technology
Suzanne Martin, Dublin Institute of Technology
Vincent Toal, Dublin Institute of Technology

Document Type Conference Paper

Conference proceedings of the International Commission for Optics Topical meeting on Emerging trends and novel materials in photonics, v.1288, 43-46, 2009.


The formation of surface relief profile in photopolymerisable systems when illuminated with a focused beam of light is simulated numerically using a two-way diffusion model that accounts both for monomer and short polymer chains diffusion. The concentration and spatial distribution dynamics of monomer, short and long polymer chains are calculated. It is assumed that the surface profile is a linear combination of monomer and polymer concentration with appropriate coefficients accounting for polymer shrinkage. A good agreement between the calculated and the experimentally measured profiles is observed thus demonstrating the successful application of the two way diffusion in modeling this system.